Technology

First Stage Of Nanoscale Imaging In Positive-Tone EUV Photoresists: The Impact Of Polymer Sequence (Berkeley Lab, Columbia Hill)

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SemiEngineering

Published

Oct 6, 2025

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Researchers from Lawrence Berkeley National Laboratory and Columbia Hill Technical Consulting published a technical paper titled "Initial stage of nanoscale imaging in positive-tone extreme UV photoresists: the influence of polymer sequence." The paper explores the impact of polymer chain uniformity on the radiolytic process in extreme ultraviolet (EUV) lithography. The study uses stochastic reaction-diffusion calculations to evaluate how different polymer chain structures affect the formation of species crucial for defining image resolution. The results indicate that polymer sequence does not significantly affect the composition of these species, suggesting that potential improvements in imaging may come from post-imaging lithographic processes.

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