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eBeam Initiative At SPIE ALP 2026: Continuing Progress On Curvilinear, EUV, And Data Challenges

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SemiEngineering

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The eBeam Initiative's annual lunch at SPIE Advanced Lithography and Patterning highlighted progress in curvilinear masks, EUV adoption, data handling, and multi-beam mask writers. Aki Fujimura discussed the feasibility and benefits of entirely curvilinear masks enabled by GPU computing and multi-beam writing. Tekscend Photomask's COO, Mike Hadsell, emphasized the importance of curvilinear masks in extending ArF equipment life and their role in lithography advancements. imec's Yi-Pei Tsai presented on managing curvilinear data size for mask-to-wafer fidelity. The eBeam Initiative aims to capture industry perspectives on trends and challenges through its Luminaries survey.

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