SemiEngineering
40th EMLC Honors Three Decades Of Vision From Dr. Uwe Behringer
The 40th European Mask Lithography Conference (EMLC) celebrated Dr. Uwe Behringer's 30 years of leadership and marked a significant milestone in the field. The event featured presentations on cutting-edge photomask and lithography technology, with keynotes from industry leaders like ESMC, GlobalFoundries, Infineon, and Zeiss. Discussions revolved around advancements in lithography technologies, challenges in mask production, and future developments in High-NA and Hyper-NA technologies. The conference also highlighted innovations in maskless lithography technologies and recognized outstanding contributions with awards. The next EMLC is scheduled for June 2026 in Jena, Germany.
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