Chinese companies unveil a swathe of breakthrough chipmaking innovations at tradeshow — chipmaking lithography tools, software design tools, and resists all on display as the nation pursues self-sufficiency

Chinese companies showcased various chipmaking innovations at the WeSemiBay Semiconductor Ecosystem Expo, including lithography tools, software design tools, and photoresists. Amies Technologies unveiled a lithography tool for compound semiconductors, while SiCarrier's subsidiaries introduced advanced EDA tools and photoresists for EUV lithography. SiCarrier's design arm presented home-grown EDA software platforms that enhance design efficiency. Despite the absence of ASML EUV lithography tools in China, Skyverse Technology introduced a photoresist suitable for EUV production. Additionally, SiCarrier's subsidiary, Long Sight, showcased a 90 GHz real-time oscilloscope for signal-integrity analysis.