American startup Substrate promises 2nm-class chipmaking with particle accelerators, at a tenth of the cost of EUV — X-ray lithography system has potential to surpass ASML's EUV scanners

American startup Substrate is developing an X-ray lithography system using particle accelerators to achieve 2nm-class chipmaking, rivaling ASML's EUV scanners but at a fraction of the cost. The company aims to offer finer resolutions at a lower cost than current lithography methods by 2030. Substrate's technology involves a custom particle accelerator to produce X-ray radiation for chipmaking, potentially reducing chip production costs significantly. While the company has shown promising results in lab environments, challenges remain in scaling the technology for commercial production, including developing compatible photoresists and ensuring consistent yield. Substrate plans to build its own fabs and offer foundry services, potentially reshaping the semiconductor supply chain in the U.S.